The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2004

Filed:

Feb. 28, 2002
Applicant:
Inventors:

Chicara Kawamura, Hiratsuka, JP;

Kei Ito, Hiratsuka, JP;

Ichiro Yoshihara, Fujisawa, JP;

Nobushige Numa, Ebina, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 1/104 ;
U.S. Cl.
CPC ...
C08J 1/104 ;
Abstract

Processes for producing within a short time transparent alkyd resins which are substantially free of occurrence of foreign matters or filtration residues are disclosed, which comprise depolymerizing polyester resins whose chief starting material is terephthalic acid and which have been recovered from waste materials and regenerated, with use of a polyhydric alcohol component having tetra- or higher hydric alcohol, and thereafter adding thereto a polybasic acid component (and if necessary a fatty acid component) to effect an esterification reaction.


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