The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Aug. 17, 2000
Applicant:
Inventors:
Georg Gogg, D-85652 Pliening, DE;
Dirk Maarten Knotter, 5656 AA Eindhoven, NL;
Charlene Reaux, Chaska, MN (US);
Steve Nelson, Chaska, MN (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
A method of manufacturing an electronic device, in particular but not exclusively a semiconductor device, in which method a substrate ( ) is placed inside a process chamber ( ) and a surface ( ) of the substrate ( ) is subjected to an ozone treatment comprising the steps of: providing a liquid onto the surface ( ) of the substrate ( ) via first supply means, introducing a solution comprising a liquid carrier solvent and ozone gas into the process chamber ( ) via second supply means, without bringing about direct contact between the solution and the surface ( ) of the substrate ( ).