The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Oct. 12, 2001
Brian Martin, Devon, GB;
Christine Wallace, Devon, GB;
Abstract
A method of carrying out optical proximity correction in the design of a reticle for exposing a photoresist of a wafer in photolithography using a lens having a focal plane, the method including generating a dense-isolated offset focus/exposure matrix, containing dense-isolated offset values, being the difference between values of linewidth for dense and isolated lines, as a function of focal plane position, for each of a plurality of different exposures, selecting from among the contours of the dense-isolated offset focus/exposure matrix for each different exposure, the flattest contour, and carrying out optical proximity correction on the basis that the exposure will be the exposure corresponding to said flattest contour.