The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Mar. 01, 2001
Kenneth K. Wong, Amherst, NY (US);
Dante Patrick Bonaquist, Grand Island, NY (US);
Praxair Technology, Inc., Danbury, CT (US);
Abstract
This invention is directed to a method for purifying argon from an impure argon stream. If the oxygen concentration in the impure argon is less than about 10 mole percent of oxygen, the invention is proceeded in the sequential steps of a) removing chlorine from the impure argon stream; b) adding hydrogen to the impure argon stream; c) removing carbon dioxide and water from the impure argon stream; d) removing hydrogen from the impure argon stream; and e) removing nitrogen from the impure argon stream to form a purified argon stream. If the oxygen concentration in the impure argon is greater than about 10 mole percent of oxygen, the method comprises the sequential steps of a) removing chlorine from the impure argon stream; b) removing carbon dioxide and water from the impure argon stream; c) removing nitrogen and oxygen from the impure argon stream; d) adding hydrogen to the impure argon stream; e) removing water from the impure argon stream; f) removing hydrogen from the impure argon stream; and g) removing nitrogen from the impure argon stream to form a purified stream.