The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 03, 2004

Filed:

Feb. 28, 2001
Applicant:
Inventors:

Mitsuo Ukechi, Tokyo, JP;

Ryoji Kaku, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 4/310 ;
U.S. Cl.
CPC ...
B29C 4/310 ;
Abstract

Fine particles ( ) are oriented and dispersed in a polymer medium to obtain a composite material ( ), which is high-density compression molded to such a size that a photonic band gap develops, thereby obtaining a photonic crystal element ( ). The orientation of the fine particles ( ) in the polymer medium can be carried out on a scale (tens of micrometers to several millimeters) where required manipulations can be done with ease.


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