The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2004
Filed:
Apr. 22, 2002
Mark A. Church, Los Gatos, CA (US);
Alain Michel Louis Desouches, Santa Cruz, CA (US);
Richard E. Krebs, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An in-situ (result-directed/predictive) MR stripe height calibration method capable of operating on the fly during lapping operation. The method involves utilization of an interval sampling technique, which provides a high number of data points. The data provided are filtered and averaged at each kerf location to provide a much higher calibration accuracy than previously available. The primary advantage is to create an accurate relationship between MR element resistance and its stripe height while the MR element is being lapped. The method thus provides the ability to target either resistance or stripe height or a combination of both during the lapping process. Finally, the system is completely self-contained and does not required wafer data.