The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2004
Filed:
Aug. 13, 2002
Hirotaka Yoshida, Sodegaura, JP;
Shin Fukuda, Sodegaura, JP;
Hiroshi Ishikawa, Sodegaura, JP;
Masaru Tanabe, Sodegaura, JP;
Mitsui Chemicals, Inc., Tokyo, JP;
Abstract
An object of the invention is to provide a sidelight type backlighting apparatus having high brightness, which is yet reduced in uneven brightness, and to provide a reflector substrate having a surface profile necessary for obtaining such apparatus and a reflector having high brightness and long durability in which the reflector substrate is implemented. A buffer against strain is formed by providing space by protrusions or the like between a light guiding plate of a planar light source apparatus and a reflecting surface of a reflection sheet provided on one main surface of the light guiding plate. Further, a base layer, a metallic layer mainly containing silver, and a light transmitting oxide layer are laminated on the substrate in this order to form a reflection layer.