The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2004

Filed:

Oct. 31, 2001
Applicant:
Inventors:

Gautam Meda, Corning, NY (US);

Michael Rivera, Columbia, MD (US);

Michael W. Price, Big Flats, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/314 ; C03C 1/016 ;
U.S. Cl.
CPC ...
G02B 1/314 ; C03C 1/016 ;
Abstract

A birefringence minimizing fluoride crystal vacuum ultraviolet (&ldquo;VUV&rdquo;) optical lithography lens element is provided for use with lithography wavelengths<230 nm. The VUV lithography lens element has an optical axis encompassed by a lens perimeter with the fluoride crystal lens having a variation in crystallographic orientation direction which tilts away from the optical center axis towards the lens perimeter to provide minimal birefringence. The invention includes a birefringence minimizing fluoride crystal optical lithography lens blank with a variation in crystallographic orientation direction across the blank.


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Meda, Gautam. (2004). Birefringence minimizing fluoride crystal optical vuv microlithography lens elements and optical blanks (U.S. Patent No. 6683714). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6683714

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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