The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2004
Filed:
Jul. 07, 1998
Applicant:
Inventors:
David T Dutton, Malvern, GB;
Anthony B Dean, Malvern, GB;
Assignee:
Qinetiq Limited, London, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81B 7/04 ;
U.S. Cl.
CPC ...
B81B 7/04 ;
Abstract
A method of forming three-dimensional structures on a substrate by a single reactive ion each run whereby a mask is formed on said substrate before a series of iterations are carried out, each iteration including a mask etch and a substrate etch, so that successive iterations give life to reduction in the mask area and exposure of further areas of substrate.