The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2004

Filed:

Jun. 04, 2002
Applicant:
Inventors:

Bernd Heinz, Sevelen, CH;

Martin Dubs, Trubbach, CH;

Thomas Eisenhammer, Azmoos, CH;

Pius Grunenfelder, Wangs, CH;

Walter Haag, Grabs, CH;

Stanislav Kadlec, Buchs, CH;

Siegfried Krassnitzer, Feldkirch, AT;

Assignee:

Unaxis Balzers Limited, Furstentum, LI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/435 ;
U.S. Cl.
CPC ...
C23C 1/435 ;
Abstract

To optimize the yield of sputtered-off material as well as the service life of the target on a magnetron source, in which simultaneously good attainable distribution values of the layer on the substrate, stable over the entire target service life, a concave sputter face in a configuration with small target-substrate distance d is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is disposed stationarily and an eccentrically disposed inner pole with a second outer pole part is developed rotatable about the central source axis


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