The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 20, 2004

Filed:

Aug. 02, 2000
Applicant:
Inventors:

Ronald Martin Horn, Palo Alto, CA (US);

Samson Hettiarachchi, Menlo Park, CA (US);

James Maclain Huff, Boulder Creek, CA (US);

Jenny Y. Mui, San Jose, CA (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G05B 1/500 ; G05B 1/101 ; G05B 2/100 ; G01N 3/320 ;
U.S. Cl.
CPC ...
G05B 1/500 ; G05B 1/101 ; G05B 2/100 ; G01N 3/320 ;
Abstract

A method of monitoring process parameters and process effectiveness over a global network enables multiple processing sites to utilize globally compiled field data to determine process parameters and the like. Application parameters are received from multiple processing sites over the global network, and post-application data is received from the multiple processing sites at preset time intervals. The application parameters and the post-application data are analyzed to determine analytical models for future application parameters, which are accessible by system users via the global network.


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