The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2004
Filed:
Mar. 29, 2000
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
Cursive Chinese characters are analyzed using a semantic matching process whereby radicals within the character are first extracted and used to reduce the search space of the full lexicon to only those characters containing the matching radical. In performing the radical extraction, the input character is normalized and segmented into strokes that are in turn organized based on stroke up/down information and local maxima and minima information. Obscure breakpoints and connecting strokes are removed in the process. Dynamic program matching is then performed on a stroke basis in which stroke substitution costs are assessed on a point-by-point basis through a variety of techniques, including tangent vector analysis, center relationship assessment and starting point/ending point assessment. Dynamic programming costs are normalized based on the length of the reference radical and location dissimilarities are removed.