The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2004
Filed:
Sep. 27, 2000
Applicant:
Inventor:
Shinichi Hirakawa, Tokyo, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/762 ; G03B 2/742 ; G03D 5/00 ; G06F 7/08 ; B65H 1/00 ;
U.S. Cl.
CPC ...
G03B 2/762 ; G03B 2/742 ; G03D 5/00 ; G06F 7/08 ; B65H 1/00 ;
Abstract
The mask guiding device of the present invention has a mask guiding device that guides a substrate received from the outside. The mask guiding device is provided with a plurality of receiving portions that receives said mask from the outside.
Quick Actions:
Hirakawa, Shinichi. (2004). Substrate treating device and method, and exposure device and method (U.S. Patent No. 6680775). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6680775
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile