The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2004
Filed:
Jan. 11, 2002
Tahir Hussain, Calabasas, CA (US);
Mary C. Montes, West Hills, CA (US);
Raytheon Company, Lexington, MA (US);
Abstract
A method is provided for improving edge terminations in a semiconductor device while maintaining breakdown voltage of said semiconductor device at or near its theoretical limit. The method comprises: employing ion-implantation to create a compensated region around the semiconductor device, followed by wet chemical etching to form a mesa on the order of 0.2 to 0.3 &mgr;m. The method provides a simple but novel approach to fabricate edge terminations in semiconductor devices in general and in devices employing p-n junctions such as in a GaAs heterojunction bipolar transistor (HBT) to achieve near-ideal electrical characteristics at the device edge. Instead of traditional edge beveling techniques such as those involving grinding, sandblasting, or mesa-etching using masks, the technique disclosed herein utilizes ion-implantation to create a compensated region around the device and wet chemical etching to make a shallow mesa.