The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6679978 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 20, 2004

Filed:

Feb. 22, 2002
Applicant:
Inventors:

Herb Johnson, Kingsport, TN (US);

Mark Ford, Kingsport, TN (US);

Assignee:

AFG Industries, Inc., Kingsport, TN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; C23C 8/00 ; B05D 3/06 ; A61N 5/00 ;
U.S. Cl.
CPC ...
C23C 1/434 ; C23C 8/00 ; B05D 3/06 ; A61N 5/00 ;
Abstract

A photocatalytically-assisted self-cleaning (“PASC”) coating on a substrate enables the substrate to shed dirt simply by rinsing with water. A method of making a PASC coating includes depositing by chemical vapor deposition an alkali metal diffusion barrier layer on a substrate; sputtering an ultraviolet radiation activated layer on the alkali metal diffusion barrier layer at a temperature of 100° C. or less; and, without heating above 100° C., exposing the ultraviolet radiation activated layer to ultraviolet radiation to form the self-cleaning substrate. The sputter deposition of the ultraviolet radiation activated layer on the chemical vapor deposited alkali metal diffusion barrier layer allows the ultraviolet radiation activated layer to be activated upon exposure to UV radiation without first having been heated during and/or after deposition. The elimination of this step of heating the ultraviolet radiation activated layer results in significant process simplification and cost reduction.


Find Patent Forward Citations

Johnson, Herb. (2004). Method of making self-cleaning substrates (U.S. Patent No. 6679978). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6679978

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