The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 13, 2004

Filed:

Jul. 17, 2002
Applicant:
Inventors:

Paul N. Barnes, West Milton, OH (US);

P. Terry Murray, Dayton, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ;
U.S. Cl.
CPC ...
C23C 1/434 ;
Abstract

A method of depositing nanoparticles for flux pinning into a superconducting material is described. According to the method of the present invention, a target made of superconducting material and a substrate are placed in the deposition chamber of a pulsed laser deposition apparatus. A first, moderate vacuum level is established in the chamber and the target is irradiated with light from a pulsed, high energy laser. By virtue of the moderate vacuum level, the material ejected from the target is slowed sufficiently to agglomerate into nanoparticles having the same composition as the target material. These nanoparticles are deposited upon the substrate. A uniform layer of superconducting material is deposited on the substrate by evacuating the deposition chamber to a second, high vacuum level and performing the pulsed laser deposition process again. The nanoparticles thus deposited within the superconducting material act as a flux pinning mechanism.


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