The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2004
Filed:
Jun. 19, 2000
Naohisa Takayama, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
The present invention provides a pattern inspection apparatus whereby, even if a large number of defects are detected during inspection it is possible to continue inspection without interruption of the inspecting operation and the apparatus comprising optical means and for generating pattern image data from a pattern under test held by the moving holding means an image comparison sections that compare the pattern under inspection with reference pattern image information so as to make a judgment as to whether or not a defect exists in the partial patterns under inspection, the image comparison sections having a comparison pattern image information storage means which stores comparison pattern image data for a partial pattern under inspection, reference pattern image information storage means and/or which store reference pattern image data corresponding to the partial patterns under inspection and an image processing means that perform a comparison between the comparison pattern image data and the reference pattern image data so as to make a judgment as to whether or not there is a defect in the pattern under inspection. This apparatus further having a defect information accumulation means which sequentially stores defect information of a prescribed partial pattern under inspection in the respective inspection regions output by the image processing means in the image comparison sections and a reviewing means which outputs defect information at a prescribed time.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile