The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2004

Filed:

May. 03, 2001
Applicant:
Inventors:

Satoshi Niiyama, Yokohama, JP;

Noriko Suehiro, Yokohama, JP;

Assignee:

OPTREX Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1343 ;
U.S. Cl.
CPC ...
G02F 1/1343 ;
Abstract

On substrates of a chiral nematic liquid crystal optical element transparent electrodes and electrical insulation layers are formed, and further, resin layers having a pencil hardness of “B” or less are formed on the electrical insulation layers by a spin coating method so as to be in contact with a liquid crystal layer When the surface hardness of the resin layers is to be measured, a glass substrate on which a resin layer is formed by screen-printing is prepared as a test piece, and the test piece is fitted to a pencil-scratching tester. The surface hardness is measured by scratching the test piece with two kinds of testing pencil selected from testing pencils having 17 grades of density.


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