The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2004
Filed:
Nov. 07, 2001
Heinz Fabian, Grossostheim, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
In a known method for producing an SiO blank, SiO particles are formed in a burner flame of a deposition burner and are deposited under the effect of an electrical field on a substrate. Starting therefrom, in order to indicate a simple and inexpensive method by means of which blanks can be produced with a predetermined, in particular axially homogeneous, mass and density distribution, it is suggested according to the invention that the geometrical shape of the burner flame ( ) is adjusted by the effect of the electrical field ( ) in dependence upon the geometrical parameter of a deposition surface ( ) of the substrate ( ) that is assigned to the burner flame ( ). An apparatus suited for performing the method comprises a substrate, at least one deposition burner for producing SiO particles in a burner flame assigned to the deposition burner, a measuring device for sensing a geometrical parameter in the area of a deposition surface of the SiO blank, and a pair of electrodes connected to a source of voltage for producing an electrical field ( ) which is operative in the area of the burner flame and is adjustable in dependence upon the geometrical parameter of that deposition surface ( ) of the substrate that is assigned to the burner flame ( ).