The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2004
Filed:
Aug. 30, 1999
Applicant:
Inventors:
Bernell Edwin Argyle, Hopewell Junction, NY (US);
Jeffery Gregory McCord, San Jose, CA (US);
Assignee:
International Business Machines Corp., Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21K 2/706 ;
U.S. Cl.
CPC ...
F21K 2/706 ;
Abstract
An apparatus, system, and method for illuminating a lithographic mask or an object in a microscope is presented, whereby the output of a laser beam homogenizer is imaged on to a field such as the object plane for lithographic application or on to the rear focal plane of an epi illuminating objective lens as a source for wide field illumination at an object plane in a microscope (for application to magnified imaging of weak phase objects)., and the image of the output is dithered with respect to the field