The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2003
Filed:
Mar. 27, 2002
Kouichi Shimamura, Nagano, JP;
Fujitsu Nagano Systems Engineering Limited, Nagano, JP;
Abstract
In a structure analysis problem for applying a pressure to a curved surface of a structure, the pressure is applied to an area approximated by a VOXEL method, so that the pressure acts on an area different from an area to which the pressure is to be intrinsically applied. In the present invention, to absorb an error of this area, the pressure to be applied is corrected in accordance with the error of the area. Also, the pressure to be applied is recorrected for an error between a correct reaction force A to a load and a total of reaction forces B at points of fulcrum calculated in a structure analysis computation and the structure analysis is performed again. If the error is within a range of tolerance, a stress and a displacement calculated by the structure analysis computation are made a last analysis result.