The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2003
Filed:
May. 15, 2002
Applicant:
Inventors:
James P. DeYoung, Durham, NC (US);
Stephen M. Gross, Chapel Hill, NC (US);
Mark I. Wagner, Raleigh, NC (US);
James B. McClain, Raleigh, NC (US);
Assignee:
Micell Technologies, Inc., Raleigh, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23G 1/02 ;
U.S. Cl.
CPC ...
C23G 1/02 ;
Abstract
A method of cleaning a microelectronic substrate is carried out by providing a cleaning fluid, the cleaning fluid comprising an adduct of hydrogen fluoride with a Lewis base in a carbon dioxide solvent; and then cleaning the substrate by contacting the substrate to the cleaning fluid for a time sufficient to clean the substrate.
DeYoung, James. (2003). Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide (U.S. Patent No. 6669785). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6669785
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile