The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2003
Filed:
Jul. 03, 2001
Applicant:
Inventor:
Atsushi Ushiroda, Kanagawa, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 2/205 ;
U.S. Cl.
CPC ...
B41J 2/205 ;
Abstract
As a thinning pattern which is used in a multipass recording method, plural mask patterns are created according to a printing mode from a pseudo periodic mask arrangement that an arrangement of non-recording pixels and recording pixels becomes visually preferable when binarization is performed at an arbitrary level. Thus, as compared with a mask pattern based on a random number, generation of a repetitive pattern and deterioration of graininess can be lowered, and the number of memories for storing the mask patterns can be reduced.