The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2003
Filed:
Oct. 12, 2001
Applicant:
Inventors:
Assignee:
Hynix Semiconductor, Inc., Kyoungki-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
The present invention relates to a method of forming a damascene gate electrode of highly integrated MOS transistor capable of easily removing a dummy polysilicon layer. The disclosed comprises the steps of forming a dummy gate insulating layer and a polysilicon layer for a dummy gate on a wafer; forming an interlayer insulating layer on the wafer; polishing the interlayer insulating layer to expose a top surface of the dummy polysilicon layer; and wet etching the exposed dummy polysilicon layer using a spin etching process.
Jang, Se. (2003). Method for forming damascene metal gate (U.S. Patent No. 6664195). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6664195
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile