The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2003
Filed:
May. 10, 2001
Applicant:
Inventors:
Jae Chang Jung, Kyoungki-do, KR;
Cha Won Koh, Kyoungki-do, KR;
Jin Soo Kim, Daejeon-shi, KR;
Sung Eun Hong, Sungnam-shi, KR;
Keun Kyu Kong, Kwangju-shi, KR;
Ki Ho Baik, Ichon-shi, KR;
Assignee:
Hynix Semiconductor Inc, Kyoungki, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 ;
U.S. Cl.
CPC ...
G03F 7/26 ;
Abstract
A process for producing a photoresist pattern is disclosed. In particular, the disclosed process for forming a photoresist pattern reduces or prevents poor quality photoresist patterns formation, especially when a high light absorbing (i.e., low transmittance) photoresist resin is used. In one aspect, a photoresist film which has been exposed to light is treated with a gas phase basic compound to produce a substantially vertical photoresist pattern.