The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2003

Filed:

Oct. 31, 2000
Applicant:
Inventors:

My T. Nguyen, Kirkland, CA;

Vadym Nazarov, Montreal, CA;

Assignee:

American Dye Source, Inc., Baie D'Urfé, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 ;
U.S. Cl.
CPC ...
G03F 7/075 ;
Abstract

Described herein is a photocurable resin composition for stereolithography comprising (a) a photocurable component, liquid at room temperature and comprising a photopolymerizable substance selected from monomers, oligomers, dendrimers and polymers and mixtures thereof, (b) at least one photoinitiator compound, and (c) at least one photoactivated color changing compound. The color changing compound can be adapted to go from essentially colorless to a given color, one given color to another or from a given color to colorless. Optionally, the resin composition will also contain component (d), namely at least one reactive silsesquioxanes (POSS).


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