The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2003
Filed:
Feb. 04, 2002
Nils Kummer, Ludwigsburg, DE;
Roland Mueller-Fiedler, Leonberg, DE;
Klaus Breitschwerdt, Filderstadt, DE;
Andre Mueller, Gerlingen, DE;
Frauke Driewer, Ettlingen, DE;
Andreas Kern, Weingarten, DE;
Robert Bosch GmbH, Stuttgart, DE;
Abstract
A method is proposed for producing three-dimensional structures, especially microlenses, in a substrate using an etching process, at least one original shape having a known original surface shape being present initially on the substrate in a plurality of places. The etching process has at least one first etching removal rate a and a second etching removal rate a which are material-dependent, and of which at least one is changeable as a function of time. The original shape is converted to a target shape by the etching process, the original surface shape of the original shape and the target surface shape of the target shape to be reached being known before the beginning of the etching process. In order to achieve the target surface shape, at least one of the etching rates a or a is set by a change of at least one etching parameter calculated before the beginning of the etching process as a function of the etching time.