The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2003
Filed:
Nov. 01, 2001
Applicant:
Inventors:
Wolfgang Lortz, Wächtersbach, DE;
Christoph Batz-Sohn, Hanau-Mittelbuchen, DE;
Gabriele Perlet, Grosskrotzenburg, DE;
Werner Will, Gelnhausen, DE;
Assignee:
Degussa AG, Dusseldorf, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09C 1/68 ; C09G 1/02 ; C09K 3/14 ; B01F 3/00 ; B01F 1/700 ;
U.S. Cl.
CPC ...
C09C 1/68 ; C09G 1/02 ; C09K 3/14 ; B01F 3/00 ; B01F 1/700 ;
Abstract
An aqueous dispersion containing a cerium oxide-doped, pyrogenically produced silicon dioxide, wherein the cerium oxide is introduced through an aerosol of a cerium salt solution or suspension and the average particle size in the dispersion is less than 100 nm. The dispersion is produced by dispersing the cerium oxide-doped, pyrogenically produced silicon dioxide in aqueous solution by means of a high energy input. The aqueous dispersion can be used for chemical-mechanical polishing.