The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2003
Filed:
Jan. 11, 2001
Tetsuo Ono, Iruma, JP;
Takafumi Tokunaga, Iruma, JP;
Tadashi Umezawa, Oume, JP;
Motohiko Yoshigai, Hikari, JP;
Tatsumi Mizutani, Tokyo, JP;
Tokuo Kure, Tokyo, JP;
Masayuki Kojima, Tokyo, JP;
Takashi Sato, Kudamatsu, JP;
Yasushi Goto, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A surface processing method of a sample having a mask layer that does not contain carbon as a major component formed on a substance to be processed, the substance being a metal, semiconductor and insulator deposited on a silicon substrate, includes the steps of installing the sample on a sample board in a vacuum container, generating a plasma that consists of a mixture of halogen gas and adhesive gas inside the vacuum container, applying a radio frequency bias voltage having a frequency ranging from 200 kHz to 20 MHz on the sample board, and controlling a periodic on-off of the radio frequency bias voltage with an on-off control frequency ranging from 100 Hz to 10 kHz.