The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2003
Filed:
May. 09, 2002
Applicant:
Inventors:
Ye Liu, Singapore, SG;
Dong-Fei Li, Singapore, SG;
Rong Wang, Singapore, SG;
Tai-Shung Chung, Singapore, SG;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 5/322 ; B01D 7/164 ;
U.S. Cl.
CPC ...
B01D 5/322 ; B01D 7/164 ;
Abstract
A process is provided for chemically modifying a dual-layer hollow fibre, wherein the fibre comprises a first layer consisting essentially of a polyimide and a second layer consisting essentially of a polymer which is substantially unaffected by the chemical modification process. The process comprises contacting the polyimide layer with a polyamine. In addition, a process is provided for chemically modifying a polyimide membrane in general, using a process which comprises contacting the membrane with an alcoholic solution of an aliphatic-aromatic polyamine.