The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2003

Filed:

Feb. 12, 2002
Applicant:
Inventors:

Gang Fang, North York, CA;

Yuri Lawryshyn, Komoka, CA;

Jan M. Maarschalkerweerd, Mount Brydges, CA;

Douglas Penhale, London, CA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/175 ;
U.S. Cl.
CPC ...
G01N 2/175 ;
Abstract

A cleaning apparatus for use in a fluid treatment system comprising a radiation source assembly, the cleaning apparatus comprising: at least one cleaning sleeve ( ) in sliding engagement with the exterior of the radiation source assembly ( ); a cleaning chamber ( ) disposed in the at least one cleaning sleeve in contact with a portion of the exterior of the radiation source assembly ( ) and for being supplied with a cleaning solution, the cleaning chamber comprising an opening ( ) to an exterior of the cleaning sleeve; a pressure equalization member ( ) disposed in the opening to provide a seal between the opening and the exterior of the cleaning sleeve, the pressure equalization member being movable in response to a pressure gradient thereacross; and drive means to translate the at least one cleaning sleeve along the exterior of the radiation source assembly. A fluid treatment device comprise the cleaning apparatus is also described.


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