The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2003
Filed:
Mar. 09, 2001
Taku Watanabe, Miyagi, JP;
Sony Corporation, Tokyo, JP;
Abstract
A slidable shutter, which is supported by a case body containing a recording medium that opens/closes an opening formed in the case body, and includes at least two layers composed of a base layer and at least one covering layer formed to cover the base layer. Within this shutter, there is a hue difference within a range of two or more in the hue cycle of the PCCS (Practical Color Coordinate System) between at least two uppermost layers of the shutter and the underlying layer thereof. Surface markings of the shutter are formed by cutting away regions, corresponding to the markings, from the surface portion of the shutter to a depth extending either to the bottom of the uppermost layer or to part of the underlying layer through the uppermost layer. In this way, the marking formation on the surface portion of this shutter will effectively reduce cost, improve workability, and enhance the visibility of the markings.