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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6656660 B1

PDFFull Text
Date of Patent:
Dec. 02, 2003

Filed:

Jan. 27, 2000

Resist composition

Applicant:
Inventors:

Fumiyoshi Urano, Kawagoe, JP;

Hirotoshi Fujie, Kawagoe, JP;

Naoki Takeyama, Settsu, JP;

Koji Ichikawa, Ashiya, JP;

Assignee:

Sumitomo Chemical Company, Limited, Osaka, JP;

Attorney:

Armstrong, Westerman & Hattori, LLP

Primary Examiner:

Janet Baxter

Assistant Examiner:

Yvette C Thornton

Int. Cl.
CPC ...
G03C 7/00 ;
U.S. Cl.
CPC ...
G03C 7/00 ;
Abstract

A resist composition comprising (a) at least two kinds of polymers which become alkali-soluble by the action of an acid, (b) as a photoacid generator, a combination of an alkylsulfonyl diazomethane compound and a triarylsulfonium arylsulfonate compound or a diaryliodonium arylsulfonate compound, and (c) a solvent is excellent as a chemically amplified resist composition to give excellent pattern shape and very fine line-and-space, particularly when exposed to lights having a wavelength of 300 nm or less.

Find Patent Forward Citations

Urano, Fumiyoshi. (2003). Resist composition (U.S. Patent No. 6656660). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6656660

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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