The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2003
Filed:
Jul. 26, 1999
Applicant:
Inventors:
Elke Fritsch, München, DE;
Christine Dehm, München, DE;
Hermann Wendt, Grasbrunn, DE;
Volker Weinrich, München, DE;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 ; C23F 3/00 ;
U.S. Cl.
CPC ...
B44C 1/22 ; C23F 3/00 ;
Abstract
A cleaning process for cleaning CVD units is disclosed. In the cleaning process, alkaline earth metal and/or metal-containing process residues, which form an amorphous film on reactor walls, are removed using a dry etching medium containing free diketones at a greatly reduced pressure and an elevated temperature. In the process, the free diketones react with the alkaline earth metals or metals to form volatile complexes.
Fritsch, Elke. (2003). Process for cleaning cvd units (U.S. Patent No. 6656376). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6656376
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile