The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2003
Filed:
Sep. 18, 2001
Applicant:
Inventors:
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A01J 9/24 ;
U.S. Cl.
CPC ...
A01J 9/24 ;
Abstract
The present application discloses a method of manufacturing a spacer having an excellent characteristic, and more particularly a method of efficiently manufacturing the spacer. Specifically, in a method of manufacturing a spacer used in an electron beam generating device, there is provided a step of providing a material for forming a film on a film formation surface of a spacer base substance in a state where the spacer base substance is nipped, wherein the material providing step is achieved in a state where the film formation surface is not projected from an end portion of a nipping member for nipping the spacer base substance.