The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2003
Filed:
Jun. 11, 2001
Bin Huang, Fremont, CA (US);
Edward Hinpong Lee, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of fabricating a second pole piece layer of a write head is constructed using first and second photoresist layers which are sensitive to light with different bandwidths. The second photoresist layer, which is on top of the first photoresist layer, is light exposed with light that excludes light that would change the molecular structure of the first or bottom photoresist layer. After light exposure and development of the second photoresist layer to provide an opening for yoke and back gap portions of the second pole piece layer, the first photoresist layer is light exposed with light that includes the light excluded in the light exposure step of the second photoresist layer. The light exposure of the first photoresist layer and its developing provides the first photoresist layer with an opening for electroplating the second pole tip of the second pole piece layer. Since the first photoresist layer is significantly thinner, penetration of light during the light exposure step of the first photoresist layer has less dispersion and more accurately defines the width and location of the first and second side edges of the second pole tip which determines the track width of the write head.