The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
Dec. 05, 2000
Steven Treiber, Oakville, CA;
Ronald McLeod, Oakville, CA;
Alex Kalafatis, Toronto, CA;
Sundaram Ramanathan, Lexington, MA (US);
Simon Lingard, Lexington, MA (US);
Chau-Chyun Chen, Lexington, MA (US);
Aspen Technology, Inc., Cambridge, MA (US);
Abstract
A first principles, steady state model of a desired polymer process is applied with a non-linear optimizer to a linear controller. Model process gains and optimal target values for controller variables result. These results are utilized by a multivariable linear controller to achieve nonlinear control of the subject process. Preferably the nonlinear optimizer is DMO/SQP. The steady state model is produced by Polymers Plus and the linear controller is DMCplus, all of Aspen Technology, Inc. in Cambridge Mass.