The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6653653 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 25, 2003

Filed:

Jul. 13, 2001
Applicant:
Inventor:

Louis C. Brousseau, III, Raleigh, NC (US);

Assignee:

Quantum Logic Devices, Inc., Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/906 ;
U.S. Cl.
CPC ...
H01L 2/906 ;
Abstract

A single-electron transistor includes a projecting feature, such as a pyramid, that projects from a face of a substrate. A first electrode is provided on the substrate face that extends onto the projecting feature. A second electrode is provided on the substrate face that extends onto the projecting feature and that is spaced apart from the first electrode. At least one nanoparticle is provided on the projecting feature between the first and second electrodes. Accordingly, the geometric configuration of the projecting feature can define the spacing between the first and second electrodes. The single-electron transistors may be fabricated by forming a projecting feature on a substrate that projects from a face thereof, forming a first electrode on the substrate face that extends onto the projecting feature, forming a second electrode on the substrate face that extends onto the projecting feature and that is spaced apart from the first electrode, and placing at least one nanoparticle on the projecting feature between the first and second electrodes.


Find Patent Forward Citations

Brousseau, III, Louis. (2003). Single-electron transistors and fabrication methods in which a projecting feature defines spacing between electrodes (U.S. Patent No. 6653653). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6653653

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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