The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
Mar. 24, 2000
Samuel Bucourt, Bures sur Yvette, FR;
Xavier Levecq, Gif sur Yvette, FR;
Imagine Optic, Orsay, FR;
Abstract
A method and device for measuring optical wavefront shape parameters based on line-by-line analysis of the wavefront are disclosed. The method comprises at least one step (ACQ ) consisting of acquiring a wavefront line. The acquisition comprises detecting (DET ) the line for delivering an electric signal characterizing it, for example, by means of a detection module including, in particular, an array of microlenses and a sensor, the module capable of being mobile in rotation and/or in translation. The acquisition comprises a step (Ts ) for processing the signal for determining a set K of parameters, for example, values proportional to the wavefront phase values measured on the line. In an embodiment, the method further comprises a step (REC ) for reconstructing each wave line consisting, for example, in expressing the line phase on a base of orthogonal polynomials, then a step (REC ) for reconstructing the wavefront on the basis of the reconstructed lines. The method and apparatus are applicable in laboratories and industry, for example, for characterizing optical components or systems.