The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6653409 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 25, 2003

Filed:

Feb. 25, 2002
Applicant:
Inventors:

Makoto Ashiura, Hiratsuka, JP;

Keisuke Chino, Hiratsuka, JP;

Tetsuji Kawazura, Hiratsuka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 8/30 ;
U.S. Cl.
CPC ...
C08F 8/30 ;
Abstract

A radical-modified polymer having a free radical compound stable in the presence of oxygen at an ordinary temperature at the end of the molecule thereof or in the molecular chain thereof and a polymer composition containing the same.


Find Patent Forward Citations

Ashiura, Makoto. (2003). Radical-modified polymer and polymer composition containing the same (U.S. Patent No. 6653409). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6653409

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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