The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
Apr. 23, 2001
Shinichi Shimomaki, Akishima, JP;
Makoto Miyagawa, Fussa, JP;
Hiromitsu Ishii, Hamura, JP;
Yayoi Nakamura, Hino, JP;
Toshiaki Higashi, Yokohama, JP;
Casio Computer Co., Ltd., Tokyo, JP;
Abstract
An active matrix substrate includes a line layer formed of an Al-based metal layer and a part of which is exposed through a contact hole formed in an insulating film. In the active matrix substrate, pixel electrodes are formed of an ITO film on the insulating film, and a jumper line for connecting a disconnected portion of a protect ring, a surface layer of a data line connecting pad, and a line protecting film are formed at the same time as the pixel electrodes are formed. This reduces the number of fabrication steps. The ITO film is patterned by dry etching due to reactive ion etching using a mixed gas of a hydrogen halide gas and an inert gas, with the temperatures of the center portion and peripheral portion of the substrate substantially equalized to each other.