The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
Jul. 09, 2001
John Haetak Choi, Wilmington, DE (US);
E. I. du Pont Nemours and Company, Wilmington, DE (US);
Abstract
The invention is directed to a process for patterning ceramic tape wherein a photoresist is applied to a ceramic tape, which enables the photoresist, after being exposed patternwise, and developed, to act as a development mask for the tape. The tape then undergoes a development stage, which ultimately removes undesired sections of tape. The tape contains polymeric binder(s) with acidic or alkaline functional pendant groups but not photosensitive ingredients. Therefore, the tape is aqueous processable but itself cannot be photoimaged. However, when this tape is used with conventional photoresists that have the development chemistry opposite from that of the tape, it allows the photoresist to be used as a development barrier layer for the tape.