The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
May. 31, 2001
Deuk Su Lee, Kyoungki-do, KR;
Jung Mok Jun, Seoul, KR;
Boe-Hydis Technology Co., Ltd., Kyoungki-do, KR;
Abstract
The present invention discloses a photo mask employing in a TFT-LCD fabrication using 4-mask process. The disclosed photo mask comprises a transparent substrate and a shielding pattern formed thereon, wherein the shielding pattern includes a pair of first shielding patterns each having the rectangular shape disposed with separation to cover source and drain formation regions, a pair of second shielding patterns of a bar type disposed between the first shielding patterns and third shielding patterns of a bar type disposed on lower and upper portions of the first and the second shielding patterns to make a clear division between a light transmittance region and a light shielding region on the edge of a channel region.