The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
Jun. 20, 2001
Masaru Segawa, Yokohama, JP;
Masahiko Sugiyama, Yokohama, JP;
JVC Victor Company of Japan, Ltd., Yokohama, JP;
Abstract
In a first forming process, by injecting a predetermined amount of oxygen gas, magnetic metal vapor is deposited as a nonmagnetic underlayer on a base film F wound on one film winding roll B while advancing the base film F in a reverse direction (second direction) toward another film winding roll A along a cooling can roll from a minimum incidence angle side to a maximum incidence angle side of an incidence angle controlling mask . In a second forming process, by injecting a extremely smaller amount of oxygen gas than in the first forming process, magnetic metal vapor is deposited as a magnetic layer over the nonmagnetic underlayer while advancing the base film deposited with the nonmagnetic underlayer wound on the other film winding roll A in a forward direction (first direction) toward the film winding roll B along the cooling can roll from the maximum incidence angle side to the minimum incidence angle side of the incidence angle controlling mask