The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2003
Filed:
Sep. 27, 2000
W. Alan Propp, Idaho Falls, ID (US);
Mark D. Argyle, Idaho Falls, ID (US);
Stuart K. Janikowski, Idaho Falls, ID (US);
Robert V. Fox, Idaho Falls, ID (US);
William J. Toth, Idaho Falls, ID (US);
Daniel M. Ginosar, Idaho Falls, ID (US);
Charles A. Allen, Idaho Falls, ID (US);
David L. Miller, Idaho Falls, ID (US);
Bechtel BWXT Idaho, LLC, Idaho Falls, ID (US);
Abstract
The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.