The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2003
Filed:
Aug. 13, 2002
Pascal Colpo, Ispra, IT;
François Rossi, Biandronno, IT;
European Community (EC), Brussels, BE;
Abstract
The apparatus for plasma treatment of a non-conductive hollow substrate ( ), comprises a plasma chamber ( ) provided with two oppositely facing field admission windows ( ), and first and second opposite coil arrangements ( ) located on an outer surface ( ) of the first and second windows respectively. The first and second coil arrangements being connected to power supply means ( ) such that a current (I) of a same direction flows simultaneously in the first and second coil arrangements. The two coil arrangements ( ) induce through the substrate a magnetic flux ( ) transversal and perpendicular to a substrate depth (L) for generating an electrical field in the substrate plan.