The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2003

Filed:

Apr. 24, 2000
Applicant:
Inventors:

Maximilian Haider, D-69251 Gaiberg, DE;

Stephan Uhlemann, D 69126 Heidelberg, DE;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/710 ;
U.S. Cl.
CPC ...
H01J 3/710 ;
Abstract

The invention relates to a method for eliminating axial image deformations &agr; in electron optical systems, where the extra-axial image deformation of the order n+m with the same behavior in &agr; , which thus has the form &agr; &ggr; , is modified by shifting or tilting the beam path towards the optical axis until compensation of the axial image deformation has been achieved, whereby &ggr; describes the extra-axial image coordinate as a complex number in both sections. The invention also relates to an adjustment method for eliminating all first-, second- and third-order axial image deformations during correction of the third-order spherical aberration in electron optical systems with hexapoles.


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