The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2003

Filed:

Mar. 15, 2002
Applicant:
Inventors:

Michael C. Pirrung, Durham, NC (US);

J. Leighton Read, Palo Alto, CA (US);

Stephen P. A. Fodor, Palo Alto, CA (US);

Lubert Stryer, Stanford, CA (US);

Assignee:

Affymetrix, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 4/000 ; C12Q 1/68 ; C07H 2/102 ;
U.S. Cl.
CPC ...
H01J 4/000 ; C12Q 1/68 ; C07H 2/102 ;
Abstract

A method and apparatus for preparation of a substrate containing a plurality of sequences. Photoremovable groups are attached to a surface of a substrate. Selected regions of the substrate are exposed to light so as to activate the selected areas. A monomer, also containing a photoremovable group, is provided to the substrate to bind at the selected areas. The process is repeated using a variety of monomers such as amino acids until sequences of a desired length are obtained. Detection methods and apparatus are also disclosed.


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