The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2003
Filed:
Sep. 19, 2001
Eiichi Fujii, Suwa, JP;
Kimio Nagasaka, Suwa, JP;
Seiko Epson Corporation, , JP;
Abstract
Provided is a manufacturing method and manufacturing device of a microstructure capable of forming resin patterns on a substrate without any “offset portion”. A substrate and a stamper to which a concave/convex pattern is formed are aligned so as to be flush; resin is infiltrated from one end side of the stamper to the aligned face of the substrate and stamper , and the resin is drawn into the concave/convex pattern of the stamper by setting the barometric pressure of the other end side of the stamper to be relatively lower than the one end side of the stamper ; resin that spread in the concave/convex pattern of the stamper is cured; and a resin pattern transferred from the stamper is obtained on the substrate by separating the substrate and stamper