The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2003

Filed:

Nov. 05, 2001
Applicant:
Inventors:

Hwei-Ling Yau, Rochester, NY (US);

Kevin M. O'Connor, Webster, NY (US);

Elmer C. Flood, Canandaigua, NY (US);

David E. Decker, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/76 ; G03C 1/106 ; G03C 5/29 ; G03C 5/26 ; G03C 1/116 ;
U.S. Cl.
CPC ...
G03C 1/76 ; G03C 1/106 ; G03C 5/29 ; G03C 5/26 ; G03C 1/116 ;
Abstract

The present invention is a photographic element which includes a support, at least one silver-halide emulsion layer superposed on the support and a processing-solution-permeable overcoat overlying the silver-halide emulsion layer that becomes water-resistant in the final product, without requiring lamination or fusing. The presence, in the coating composition, of a compound comprising a blocked copolymer of ethylene oxide and propylene oxide has been found to improve wet durability, prevent the retention of iron, and improve the conversion of the overcoat to a water-resistant layer during processing. The present invention is also directed to a method of making a photographic print involving developing the photographic element.


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